Particle Beam Systems & Technology

SPECIFICATIONS

The Model EB-04-20 is a negative-polarity Electron-Beam power supply designed for operation in Scanning Electron Microscope (SEM) with Schottky Field Emission (SFE) electron source and acceleration voltages up to -20kV. It consists of four independently-operated supplies: Accelerator (Beam), Suppressor (Wehnelt or Bias), Extractor, and Filament. Filament is constant current supply and the rest of the supplies are constant voltage. Suppressor and Extractor voltages and Filament current are floating on Accelerator potential. Output voltages and filament current are precisely controlled and monitored through a microprocessor interface using commands sent to the power supply over a serial interface from a controller.

SPECIFICATIONS

The Model EB-05-15 is a negative-polarity Electron-Beam power supply designed for operation in Scanning Electron Microscope (SEM) instrument with Schottky Field Emission (SFE) electron source and acceleration voltage up to -15kV. It consists of five independently-operated supplies: Accelerator (Beam), Suppressor (Wehnelt or Bias), Extractor, Filament, and Focus (Condenser). Filament is constant current supply and the rest of the supplies are constant voltage. Voltages of Suppressor and Extractor, and Filament current are floating on the Accelerator potential. Output voltages and currents are precisely controlled and monitored through a microprocessor interface using commands sent to the power supply over a serial interface from a controller.

SPECIFICATIONS

The Model EB-05-06 is ultra-quiet negative-polarity Electron-Beam power supply designed for low acceleration voltage operation in Scanning Electron Microscope (SEM) instruments with Schottky Field Emission (SFE) electron source and acceleration voltages up to -6kV. It consists of five independently-operated supplies: Accelerator (Beam), Suppressor (Wehnelt or Bias), Extractor, Gun (Anode or Column), and Filament. Filament is constant current supply and the rest of the supplies are constant voltage. Bias, Extractor, Gun voltages and Filament current are floating on the Accelerator potential.  Output voltages and currents are precisely controlled and monitored through a microprocessor interface using commands sent to the power supply over a serial interface from a controller.

 SPECIFICATIONS

The Model EBL-03-50E is a flagship model of -50kV high voltage acceleration power supply for beam currents up to 500uA. This integrated high-voltage power supply is specifically designed for research and development applications in electron beam lithography, electron beam and negative ion beam sources, and production testing of Schottky electron sources. It features sophisticated high-precision ultra-low-noise power sources with enhanced control, feedback, and monitoring features and was specifically designed for R&D and testing environment with extremely low ripple and noise, no clock-beat ripple, and no bit hopping artifacts with up to -50kV acceleration voltage. The integrated power supply consists of three independently-operated sources: Accelerator (Beam) voltage, Suppressor (Wehnelt or Bias) voltage, and Filament power. Filament power supply can operate as voltage or current source and in power control mode; rest of the supplies are voltage sources. Suppressor voltage and central tap of Filament power supply are referenced to the Accelerator potential. 

SPECIFICATIONS

The Model EBL-03-100E is a flagship model of -100kV high voltage acceleration power supply for beam currents up to 250uA. This integrated high-voltage power suply is specifically designed for research and development applications in electron beam lithography, electron beam and negative ion beam sources, and production testing of Schottky Field Emission electron sources. It features sophisticated high-precision ultra-low-noise power sources with enhanced control, feedback, and monitoring features and was specifically designed for R&D and testing environment with extremely low ripple and noise, no clock-beat ripple, and no bit hopping artifacts with up to -50kV acceleration voltage. The integrated power supply consists of three independently-operated sources: Accelerator (Beam) voltage, Suppressor (Wehnelt or Bias) voltage, and Filament power. Filament power supply can operate as voltage or current source and in power control mode; rest of the supplies are voltage sources. Suppressor voltage and central tap of Filament power supply are referenced to the Accelerator potential.

The EBHV-200 model of acceleration power supply was specifically designed for integration into 200kV Transmission Electron Microscope (TEM) and Electron Beam Lithography (EBL) instrumentation. It is well suited for other research and development applications requiring compact, low-noise regulated source for acceleration voltages up to -200,000V for dry operation without oil mmersion or external cooling. The power supply contains integrated auxiliary power source capable of providing up to 52W referenced to the Accelerator potential, suitable for addtion of a filament power source or wehnelt /lens voltage.